Stylistic analysis of text is a key task in research areas ranging from authorship attribution to forensic analysis and personality profiling. The existing approaches for stylistic analysis are plagued by issues like topic influence, lack of discriminability for large number of authors and the requirement for large amounts of diverse data. In this paper, the source of these issues are identified along with the necessity for a cognitive perspective on authorial style in addressing them. A novel feature representation, called Trajectory-based Style Estimation (TraSE), is introduced to support this purpose. Authorship attribution experiments with over 27,000 authors and 1.4 million samples in a cross-domain scenario resulted in 90% attribution accuracy suggesting that the feature representation is immune to such negative influences and an excellent candidate for stylistic analysis. Finally, a qualitative analysis is performed on TraSE using physical human characteristics, like age, to validate its claim on capturing cognitive traits.
In the Reverse Engineering and Hardware Assurance domain, a majority of the data acquisition is done through electron microscopy techniques such as Scanning Electron Microscopy (SEM). However, unlike its counterparts in optical imaging, only a limited number of techniques are available to enhance and extract information from the raw SEM images. In this paper, we introduce an algorithm to segment out Integrated Circuit (IC) structures from the SEM image. Unlike existing algorithms discussed in this paper, this algorithm is unsupervised, parameter-free and does not require prior information on the noise model or features in the target image making it effective in low quality image acquisition scenarios as well. Furthermore, the results from the application of the algorithm on various structures and layers in the IC are reported and discussed.